New thin-film processes for the production of high-performance electroceramic membranes
The first functional test of the new INP magnetron sputtering reactor for the deposition of electroceramic thin films was carried out on 19 June 2020. In the reactor, a closed-field unbalanced magnetron sputtering technique can be used to deposit complex metal oxides with a perovskite structure (e.g. barium cerium zirconate) on the tubular substrates…